17,000 $
Make an offer| Manufacturer | SENSOFAR |
|---|---|
| Model | PLU-NEOX with Motorized X-Y Stage |
| Year | 2011 |
| Location | Malaysia
|
| Category | Semiconductors - Test and measurement equipment |
| Product id | P250611084 |
| Language |
| Software | |
| ------------------- | |
| worked hours | |
| hours under power | |
| state | as-is, where-is |
| At local norms | --------- |
| status | under power |
| Last availability date | 27/03/2026 |
The SENSOFAR PLU-NEOX with Motorized X-Y Stage, manufactured in 2011, is a sophisticated 3D optical profiler designed for nanometer-scale measurement applications. It integrates three advanced optical technologies: confocal microscopy, interferometry, and focus variation, enabling precise surface characterization on a wide range of materials including thin films and wafers. This profiler is suitable for quality assurance, quality control, and research and development environments where speed and accuracy are critical.
Key measurement capabilities include the assessment of surface roughness, finish, flatness, and waviness. The Ai focus variation technique captures each layer as the lens moves upward, allowing detailed visualization of surface shape and curvature. Confocal technology enhances surface structure imaging by permitting only focused light to pass through, while interferometry employs laser technology to achieve highly accurate measurements down to the nanometer scale, particularly effective on shiny surfaces such as wafers. Additionally, the system offers spectroscopic reflectometry for fast, accurate, and non-destructive thickness measurements on transparent layers.
The equipment comes with several accessories to facilitate operation and enhance measurement versatility. Included are a joystick and power module, a set of Nikon LU Plan Fluor microscope magnification lenses (10X, 20X, 50X, 100X), a motorized X-Y profiler stage for precise sample positioning, and a vibration isolation table to minimize external disturbances during measurement.
The setup includes a SENSOFAR-branded microscope with multiple objective lenses, a white rectangular SENSOFAR-branded control box, and a 3D navigation controller device. A Dell monitor, keyboard, and mouse are also present for system control and data analysis. The equipment is arranged on a metal perforated table and appears clean and well-organized.
System status indicators show readiness with active components including the scanning device, frame grabber, color and black & white cameras, light source, Z motor controller, and XY controller. However, a warning message indicates that a full Z range stage movement is required.
This comprehensive system is ideal for users requiring high-precision surface metrology with multiple optical measurement modalities integrated into a single platform.
The following description has been generated using artificial intelligence based on the product information available. It is provided for guidance only and may not reflect all specifications or conditions. Please contact us if you need precise or confirmed details.
3D Optical profiler nanometer measurement with confocal, interferometry and focus variation technology
A QA/QC and R&D solution engineered for speed. 3D profiling to the nanometer with 3 optical technologies and the ability to measure smooth and shiny surfaces. The S Neox measures using confocal, interferometry and focus variation techniques. For the measurement of roughness, surface finish, flatness and waviness on materials such as thin film and wafers.
Ai focus variation – Saves each layer as the lens moves upward allowing you to see shape and curvature.
Confocal – Only allows focused light through allowing you to see the surface structure. Interferometry – Uses a laser to allow very accurate measurement down to nanometers great for shiny surfaces such as wafers.
Spectroscopic Reflectometry – Perform thickness measurements on transparent layers in a quick, accurate and non-destructive way.
Accessories Includes:
Joystick & Power Module
Microscope Magnification Lens: Nikon LU Plan Flour 10X, 20X, 50X, 100X
Motorized X-Y Profiler
Vibration Isolation Table
Please note that this description may have been translated automatically. Contact us for further information. The information of this classified ad are only indicative. We recommend to check the details with the seller before a purchase
| Client type | Factory – small or medium company |
| Active since | 2023 |
| Offers online | 11 |
| Last activity | April 15, 2026 |
3D Optical profiler nanometer measurement with confocal, interferometry and focus variation technology
A QA/QC and R&D solution engineered for speed. 3D profiling to the nanometer with 3 optical technologies and the ability to measure smooth and shiny surfaces. The S Neox measures using confocal, interferometry and focus variation techniques. For the measurement of roughness, surface finish, flatness and waviness on materials such as thin film and wafers.
Ai focus variation – Saves each layer as the lens moves upward allowing you to see shape and curvature.
Confocal – Only allows focused light through allowing you to see the surface structure. Interferometry – Uses a laser to allow very accurate measurement down to nanometers great for shiny surfaces such as wafers.
Spectroscopic Reflectometry – Perform thickness measurements on transparent layers in a quick, accurate and non-destructive way.
Accessories Includes:
Joystick & Power Module
Microscope Magnification Lens: Nikon LU Plan Flour 10X, 20X, 50X, 100X
Motorized X-Y Profiler
Vibration Isolation Table
Please note that this description may have been translated automatically. Contact us for further information. The information of this classified ad are only indicative. We recommend to check the details with the seller before a purchase
| Software | |
| ------------------- | |
| worked hours | |
| hours under power | |
| state | as-is, where-is |
| At local norms | --------- |
| status | under power |
| Last availability date | 27/03/2026 |
The SENSOFAR PLU-NEOX with Motorized X-Y Stage, manufactured in 2011, is a sophisticated 3D optical profiler designed for nanometer-scale measurement applications. It integrates three advanced optical technologies: confocal microscopy, interferometry, and focus variation, enabling precise surface characterization on a wide range of materials including thin films and wafers. This profiler is suitable for quality assurance, quality control, and research and development environments where speed and accuracy are critical.
Key measurement capabilities include the assessment of surface roughness, finish, flatness, and waviness. The Ai focus variation technique captures each layer as the lens moves upward, allowing detailed visualization of surface shape and curvature. Confocal technology enhances surface structure imaging by permitting only focused light to pass through, while interferometry employs laser technology to achieve highly accurate measurements down to the nanometer scale, particularly effective on shiny surfaces such as wafers. Additionally, the system offers spectroscopic reflectometry for fast, accurate, and non-destructive thickness measurements on transparent layers.
The equipment comes with several accessories to facilitate operation and enhance measurement versatility. Included are a joystick and power module, a set of Nikon LU Plan Fluor microscope magnification lenses (10X, 20X, 50X, 100X), a motorized X-Y profiler stage for precise sample positioning, and a vibration isolation table to minimize external disturbances during measurement.
The setup includes a SENSOFAR-branded microscope with multiple objective lenses, a white rectangular SENSOFAR-branded control box, and a 3D navigation controller device. A Dell monitor, keyboard, and mouse are also present for system control and data analysis. The equipment is arranged on a metal perforated table and appears clean and well-organized.
System status indicators show readiness with active components including the scanning device, frame grabber, color and black & white cameras, light source, Z motor controller, and XY controller. However, a warning message indicates that a full Z range stage movement is required.
This comprehensive system is ideal for users requiring high-precision surface metrology with multiple optical measurement modalities integrated into a single platform.
The following description has been generated using artificial intelligence based on the product information available. It is provided for guidance only and may not reflect all specifications or conditions. Please contact us if you need precise or confirmed details.
| Client type | Factory – small or medium company |
| Active since | 2023 |
| Offers online | 11 |
| Last activity | April 15, 2026 |