383,500 $
Make an offer| Wafer size | 6 in |
| ------------------- | |
| Length x width x height | 225.0 × 75.0 × 80.0 |
| Weight | 12000 lb |
| worked hours | |
| hours under power | |
| state | as-is, where-is |
| At local norms | yes |
| status | visible but unplugged |
| Last availability date | 21/12/2025 |
The ULVAC Technologies Inc. SIV-200 is a sophisticated sputtering system designed for the deposition of thin films, including materials such as Indium Tin Oxide (ITO). This equipment is suitable for both research and development as well as production environments, offering high-speed deposition capabilities of up to 50 nm per minute. It features precise control over temperature and gas flow, allowing for accurate and repeatable sputtering processes. The system supports multi-layer sputtering and utilizes a single-source RF magnetron specifically for oxide film deposition. Currently, the system is configured with a 200 mm x 200 mm pallet capable of holding three 150 mm wafers simultaneously. Additionally, it includes an automated stacker/stocker system that can accommodate six pallets, equivalent to 19 wafers, and can be reconfigured to handle different wafer sizes as needed. The machine measures approximately 5715 mm in length, 1905 mm in width, and 2032 mm in height, with a total weight of around 5445 kg. It is equipped with essential components such as a Cryo Pump, Dry Vacuum Pump, and Umbilicals. The equipment shows a clean and well-maintained exterior with no visible damage. Safety features include multiple warning labels and an emergency stop button located on the front panel, ensuring compliance with operational safety standards. This unit is a robust solution for advanced thin film deposition requirements in semiconductor wafer processing.
The following description has been generated using artificial intelligence based on the product information available. It is provided for guidance only and may not reflect all specifications or conditions. Please contact us if you need precise or confirmed details.
The ULVAC SIV-200 is a sputtering system, used for depositing thin films like Indium Tin Oxide (ITO). It is suitable for R&D and production due to features such as high-speed deposition (up to 50nm/min), precise temperature and gas flow control, and capabilities for multi-layer sputtering. The system uses a single-source RF magnetron for oxide film deposition and can be configured for different process needs. Currently configured with a 200mm x 200mm pallet that hold qty 3 wafers (150mm) at a time., this has an automated stacker/stocker that can hold qty 6 pallets (or qty 19 wafers). Can be reconfigured for other wafers sizes. Excellent condition. Complete with Cryo Pump, Dry Vacuum Pump, and Umbilicals. More images are available upon request.
Please note that this description may have been translated automatically. Contact us for further information. The information of this classified ad are only indicative. We recommend to check the details with the seller before a purchase
| Client type | Machinery dealer |
| Active since | 2009 |
| Offers online | 4 |
| Last activity | April 7, 2026 |
The ULVAC SIV-200 is a sputtering system, used for depositing thin films like Indium Tin Oxide (ITO). It is suitable for R&D and production due to features such as high-speed deposition (up to 50nm/min), precise temperature and gas flow control, and capabilities for multi-layer sputtering. The system uses a single-source RF magnetron for oxide film deposition and can be configured for different process needs. Currently configured with a 200mm x 200mm pallet that hold qty 3 wafers (150mm) at a time., this has an automated stacker/stocker that can hold qty 6 pallets (or qty 19 wafers). Can be reconfigured for other wafers sizes. Excellent condition. Complete with Cryo Pump, Dry Vacuum Pump, and Umbilicals. More images are available upon request.
Please note that this description may have been translated automatically. Contact us for further information. The information of this classified ad are only indicative. We recommend to check the details with the seller before a purchase
| Wafer size | 6 in |
| ------------------- | |
| Length x width x height | 225.0 × 75.0 × 80.0 |
| Weight | 12000 lb |
| worked hours | |
| hours under power | |
| state | as-is, where-is |
| At local norms | yes |
| status | visible but unplugged |
| Last availability date | 21/12/2025 |
The ULVAC Technologies Inc. SIV-200 is a sophisticated sputtering system designed for the deposition of thin films, including materials such as Indium Tin Oxide (ITO). This equipment is suitable for both research and development as well as production environments, offering high-speed deposition capabilities of up to 50 nm per minute. It features precise control over temperature and gas flow, allowing for accurate and repeatable sputtering processes. The system supports multi-layer sputtering and utilizes a single-source RF magnetron specifically for oxide film deposition. Currently, the system is configured with a 200 mm x 200 mm pallet capable of holding three 150 mm wafers simultaneously. Additionally, it includes an automated stacker/stocker system that can accommodate six pallets, equivalent to 19 wafers, and can be reconfigured to handle different wafer sizes as needed. The machine measures approximately 5715 mm in length, 1905 mm in width, and 2032 mm in height, with a total weight of around 5445 kg. It is equipped with essential components such as a Cryo Pump, Dry Vacuum Pump, and Umbilicals. The equipment shows a clean and well-maintained exterior with no visible damage. Safety features include multiple warning labels and an emergency stop button located on the front panel, ensuring compliance with operational safety standards. This unit is a robust solution for advanced thin film deposition requirements in semiconductor wafer processing.
The following description has been generated using artificial intelligence based on the product information available. It is provided for guidance only and may not reflect all specifications or conditions. Please contact us if you need precise or confirmed details.
| Client type | Machinery dealer |
| Active since | 2009 |
| Offers online | 4 |
| Last activity | April 7, 2026 |
Машина за вафли Ulvac Technologies Inc. SIV-200
Waferovací stroj Ulvac Technologies Inc. SIV-200
Ulvac Technologies Inc. SIV-200 Wafer maskine
Ulvac Technologies Inc. SIV-200 Waferanlage
Μηχανή γκοφρέτας Ulvac Technologies Inc. SIV-200
Ulvac SIV-200 Sputtering System (ITO)
Máquina para wafer Ulvac Technologies Inc. SIV-200
Machine pour wafer Ulvac Technologies Inc. SIV-200
Stroj za oblatne Ulvac Technologies Inc. SIV-200
Ulvac Technologies Inc. SIV-200 Ostya gép
Macchina per wafer Ulvac Technologies Inc. SIV-200
Vaflių mašina Ulvac Technologies Inc. SIV-200
Ulvac Technologies Inc. SIV-200 Wafelmachine
Maszyna do produkcji płytek półprzewodnikowych Ulvac Technologies Inc. SIV-200
Máquina de wafer Ulvac Technologies Inc. SIV-200
Aparat pentru napolitane Ulvac Technologies Inc. SIV-200
Ulvac Technologies Inc. SIV-200 Пластина
Mašina za vafle Ulvac Technologies Inc. SIV-200
Ulvac Technologies Inc. SIV-200 Wafer maskin
Wafer Makinası Ulvac Technologies Inc. SIV-200
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